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Method of forming metal pattern, substrate including the metal pattern, and electronic device including the metal pattern
  • 발명인 S. Kim, Y. Hong, J. Nam, J. Song, B. Lee, D. Jang
  • 출원/등록번호 US19/368,825
  • 출원인 Samsung Display Co LTd, SNU R&DB Foundation
  • 출원/등록일자 2026.04.30 (Publication)
  • 연도 2026
  • 링크 #1 https://patents.google.com/patent/US20260122791A1/en
  • Abstract

    Provided is a method of forming a metal pattern by embossed patterning. The method of forming a metal pattern includes preparing a substrate, forming a metal adhesion inhibiting layer on the substrate, forming a metal adhesion pattern on the metal adhesion inhibiting layer, and applying and/or depositing a metal onto the substrate to form a metal pattern on the metal adhesion pattern, wherein the metal adhesion inhibiting layer includes a water-soluble polymer and a cellulose material.

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